Samsung announced that it has begun mass production of 9th generation 3D V-NAND TLC flash memory with a capacity of 1 Tbit. The new chips offer increased density and power efficiency compared to 8th generation 3D V-NAND TLC memory chips.
Image Source: Samsung
The manufacturer did not specify the number of layers used in the 9th generation 3D V-NAND TLC memory with a capacity of 1 Tbit, as well as the technical process used for their production. However, Samsung noted that with the industry’s smallest cell size, the bit density of the 9th generation 3D V-NAND TLC chips has been improved by approximately 50% compared to the previous generation 3D V-NAND TLC memory. The manufacturer also reported that the new memory chips use interference-prevention technology, the cells have an increased service life, and the elimination of fictitious holes in conductive channels has made it possible to significantly reduce the planar area of memory cells.
The 9th generation 3D V-NAND TLC flash memory features the next-generation Toggle 5.1 interface, which increases I/O speeds by 33% to 3.2 Gbps per pin. Along with this, the company has reduced energy consumption by 10% compared to the previous generation.
In the second half of the year, Samsung plans to begin production of ninth-generation 3D V-NAND with a capacity of 1 Tbit with QLC cells.
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